The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2010
Filed:
Apr. 07, 2004
Neils Richard Stewart Hansen, Poole, GB;
Richard Alan Sellis, Waterlooville, GB;
John Chapples, Drayton, GB;
Neils Richard Stewart Hansen, Poole, GB;
Richard Alan Sellis, Waterlooville, GB;
John Chapples, Drayton, GB;
Honeywell Analytics Ltd., Poole, Dorset, GB;
Abstract
A process is described for manufacturing gas diffusion electrodes, which process comprises: (a) treating an area of a pre-shrunk porous hydrophobic substrate so as to restrict the slurry deposited in step b) to the said area, preferably by forming a well in the area and/or treating the substrate in the area to render it less hydrophobic, e.g. by plasma treating the area; (b) dispensing a slurry of catalyst onto the said area, (c) removing liquid from the dispensed slurry, (d) treating the dried slurry to remove organic materials and e) cutting the catalyst and the underlying portion of substrate from the rest of the substrate.