The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2010
Filed:
Oct. 19, 2005
Katsuhito Nishikawa, Oakdale, CA (US);
Gary M. Moore, San Francisco, CA (US);
Aaron David Ingles, Stockton, CA (US);
Katsuhito Nishikawa, Oakdale, CA (US);
Gary M. Moore, San Francisco, CA (US);
Aaron David Ingles, Stockton, CA (US);
Moore Epitaxial, Inc., Tracy, CA (US);
Abstract
A process gas to a reactor volume of a semiconductor processing reactor is provided through gas injector ports of a gas ring. The process gas flows horizontally from the gas injector ports across a principal surface of a rotating susceptor to exhaust ports of the gas ring. The spent process gas is removed from the reactor volume through the exhaust ports.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile