The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2010
Filed:
May. 29, 2007
Chih King Lee, Taipei, TW;
Liang Bin Yu, Taipei County, TW;
Jiunn Woei Liaw, Taipei, TW;
Ding Zheng Lin, Taipei, TW;
Jyi Tyan Yeh, Hsinchu County, TW;
Yu Tsung Chiu, Taipei, TW;
Chun Ti Chen, Tainan County, TW;
Chyan Chi Wu, Hsinchi County, TW;
Chau Shioung Yeh, Taipei, TW;
You Chia Chang, Taichung, TW;
Kuo Tung Huang, Taoyuan County, TW;
Yi Chun Chen, Hualien County, TW;
Yeong Feng Wang, Taipei County, TW;
Chih King Lee, Taipei, TW;
Liang Bin Yu, Taipei County, TW;
Jiunn Woei Liaw, Taipei, TW;
Ding Zheng Lin, Taipei, TW;
Jyi Tyan Yeh, Hsinchu County, TW;
Yu Tsung Chiu, Taipei, TW;
Chun Ti Chen, Tainan County, TW;
Chyan Chi Wu, Hsinchi County, TW;
Chau Shioung Yeh, Taipei, TW;
You Chia Chang, Taichung, TW;
Kuo Tung Huang, Taoyuan County, TW;
Yi Chun Chen, Hualien County, TW;
Yeong Feng Wang, Taipei County, TW;
Industrial Technology Research Institute, Chutung Hsinchu, TW;
Abstract
The present invention provides an optical head with a single or multiple sub-wavelength light beams, which can be used in arenas such as photolithography, optical storage, optical microscopy, to name a few. The present invention includes a transparent substrate, a thin film, and a surface structure with sub-wavelength surface profile. The incident light transmits through the transparent substrate, forms a surface plasma wave along the sub-wavelength aperture located within the thin film, and finally re-emits through spatial coupling with the sub-wavelength profile of the surface structure. As the coupled re-emitting light beam or light beams can maintain the waist less than that of the diffraction limit for a few micrometers out of the surface with sub-wavelength profile in many cases, this invention can have applications ranging from micro or nano manufacturing, metrology, and manipulation by using light beams with waist smaller than the diffraction limit.