The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2010
Filed:
Oct. 24, 2008
Witold Hackemer, Bockenau, DE;
Witold Hackemer, Bockenau, DE;
Jos. Schneider Optische Werke GmbH, Bad Kreuznach, DE;
Abstract
A description is given of a macro objective (M) with a corrective compensation of aberrations (Continuous Aberration Suppression; CAS). The macro objective has a first positive optical subassembly (A), a second nearly afocal optical subassembly (B), a stop (APE), a third nearly afocal optical subassembly (B') and a fourth positive optical subassembly (A′). The third optical subassembly (B′) and the fourth positive optical subassembly (A′) are designed with mirror symmetry relative to the optical subassemblies (A, B) upstream of the stop (APE). The nearly afocal optical subassemblies (B, B′) are displaced jointly inside the macro objective (M) along the optical axis (OA) with the aid of mechanical means in conjunction with linear magnifications of β′≠−1. As a result, the macro objective (M) achieves outstanding imaging properties both over a wide range of linear magnifications (β′=−2.0 to −0.5) and over a wide wavelength spectrum.