The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2010
Filed:
Sep. 03, 2008
Tsutomu Takenaka, Utsunomiya, JP;
Tsutomu Takenaka, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus includes an illumination optical system configured to illuminate an original with exposure light from an exposure light source, a projection optical system configured to project a pattern of the original onto a substrate, and a measuring unit configured to measure a relative position between the original and the substrate via the projection optical system using the exposure light as measurement light. The exposure apparatus exposes the substrate using the exposure light with a plurality of wavelengths or a broadband wavelength upon aligning the original and the substrate based on the measurement result obtained by the measuring unit, and the measuring unit switches a wavelength of the exposure light as the measurement light to a specific wavelength or a narrow-band wavelength in measuring the relative position between the original and the substrate.