The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 2010

Filed:

Nov. 12, 2004
Applicants:

Qasem Ramadan, Singapore, SG;

Victor Samper, Singapore, SG;

Daniel Puiu Poenar, Singapore, SG;

Chen Yu, Singapore, SG;

Inventors:

Qasem Ramadan, Singapore, SG;

Victor Samper, Singapore, SG;

Daniel Puiu Poenar, Singapore, SG;

Chen Yu, Singapore, SG;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01F 3/00 (2006.01); H01F 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of forming, in or on a Si substrate, planar micro-coils with coil windings of high aspect ratio (>3) and a wide variety of geometric shapes. The micro-coils may be formed on a Si substrate and be embedded in a dielectric, or they may be formed in trenches within a Si substrate. The micro-coils may have field enhancing ferromagnetic pillars rising above the micro-coil plane, formed at positions of maximum magnetic field strength and the micro-coils may also include magnetic layers formed beneath the substrate and contacting the pillars to form a substantially closed pathway for the magnetic flux. The substrate may be thinned to membrane proportions. These micro-coils produce strong magnetic fields with strong field gradients and can be used in a wide variety of processes that involve the exertion of strong magnetic forces at small distances or the creation of magnetic wells for trapping and manipulating small particles.


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