The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2010
Filed:
Nov. 23, 2009
Jae Min OH, Gyeonggi-Do, KR;
Moo Young Lee, Gyeonggi-Do, KR;
Bum Jin Lee, Gyeonggi-Do, KR;
O Bum Kwon, Seoul, KR;
Won Seok Dong, Gyeonggi-Do, KR;
Yusuke Tsuda, Fukuoka, JP;
Jae Min Oh, Gyeonggi-Do, KR;
Moo Young Lee, Gyeonggi-Do, KR;
Bum Jin Lee, Gyeonggi-Do, KR;
O Bum Kwon, Seoul, KR;
Won Seok Dong, Gyeonggi-Do, KR;
Yusuke Tsuda, Fukuoka, JP;
Cheil Industries Inc., Gyeongsangbuk-Do, KR;
Abstract
Disclosed herein is a novel functional diamine compound having a dendron structure, polyamic acid which is produced using functional diamine, aromatic cyclic diamine, aliphatic cyclic acid dianhydride, and aromatic cyclic acid dianhydride, polyimide which is produced by imidizing polyamic acid, and an LC alignment film produced using polyimide. Even if the diamine compound is used in a small amount, it is possible to realize a high pretilt angle, thus the pretilt angle is easily controlled. Therefore, it can be used to produce an LC alignment film using a twisted nematic (TN) mode, in which the pretilt angle of liquid crystal is low, and a vertically aligned (VA) mode, which requires a high pretilt angle of about 90°.