The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2010
Filed:
Dec. 04, 2007
Bruce B. Doris, Brewster, NY (US);
Mahender Kumar, Fishkill, NY (US);
Werner A. Rausch, Stormville, NY (US);
Robin Van Den Nieuwenhuizen, Ridgefield, CT (US);
Bruce B. Doris, Brewster, NY (US);
Mahender Kumar, Fishkill, NY (US);
Werner A. Rausch, Stormville, NY (US);
Robin Van Den Nieuwenhuizen, Ridgefield, CT (US);
International Business Machines Corporation, Armonk, NY (US);
Advanced Micro Devices, Inc. (AMD), Sunnyvale, CA (US);
Abstract
A method for forming multiple self-aligned gate stacks, the method comprising, forming a first group of gate stack layers on a first portion of a substrate, forming a second group of gate stack layers on a second portion of the substrate adjacent to the first portion of the substrate, etching to form a trench disposed between the first portion and the second portion of the substrate, and filling the trench with an insulating material.