The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 07, 2010
Filed:
May. 11, 2006
Applicants:
Ryohei Satoh, Minoh, JP;
Yoshinori Iwata, Osaka, JP;
Koji Nakagawa, Osaka, JP;
Reo Usui, Minoh, JP;
Inventors:
Assignee:
Asahi Glass Company, Limited, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
There is provided a method for forming a continuous thin film circuit pattern with good precision, at low cost and with low environmental burden; an electronic circuit fabricated by the same, and an electronic device including the same. There are a step for forming a mask layeron a substrate; a step for forming an opening pattern in the mask layer; a step for forming a thin filmon the substrateand on the mask layer; and a step for removing, from the substrate, the mask layerand a portion of the thin filmformed on the mask layer; wherein the opening pattern is formed under a dry condition.