The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 2010

Filed:

Jan. 24, 2005
Applicants:

Yu-chong Tai, Pasadena, CA (US);

Matthieu Liger, Pasadena, CA (US);

Theodore Harder, Los Angeles, CA (US);

Satoshi Konishi, Shiga, JP;

Scott Miserendino, Pasadena, CA (US);

Inventors:

Yu-Chong Tai, Pasadena, CA (US);

Matthieu Liger, Pasadena, CA (US);

Theodore Harder, Los Angeles, CA (US);

Satoshi Konishi, Shiga, JP;

Scott Miserendino, Pasadena, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 3/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of making carbon thin films comprises depositing a catalyst on a substrate, depositing a hydrocarbon in contact with the catalyst and pyrolyzing the hydrocarbon. A method of controlling a carbon thin film density comprises etching a cavity into a substrate, depositing a hydrocarbon into the cavity, and pyrolyzing the hydrocarbon while in the cavity to form a carbon thin film. Controlling a carbon thin film density is achieved by changing the volume of the cavity. Methods of making carbon containing patterned structures are also provided. Carbon thin films and carbon containing patterned structures can be used in NEMS, MEMS, liquid chromatography, and sensor devices.


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