The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 2010

Filed:

Jun. 08, 2005
Applicants:

Eigo Kawakami, Utsunomiya, JP;

Hirohisa Ota, Kawagoe, JP;

Takashi Nakamura, Tokyo, JP;

Kazuyuki Kasumi, Utsunomiya, JP;

Toshinobu Tokita, Yokohama, JP;

Inventors:

Eigo Kawakami, Utsunomiya, JP;

Hirohisa Ota, Kawagoe, JP;

Takashi Nakamura, Tokyo, JP;

Kazuyuki Kasumi, Utsunomiya, JP;

Toshinobu Tokita, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B28B 17/00 (2006.01); B29C 35/08 (2006.01); B29C 59/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A processing apparatus for transferring a relief pattern on a mold to a resist on a substrate through a compression of the mold against the resist, and an irradiation of light for exposing the resist onto the resist includes a mold chuck for holding the mold and for compressing the mold against the resist, and a deformation reducing part for reducing a deformation of the mold when the mold chuck applies a compression force to the mold.


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