The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 31, 2010

Filed:

Feb. 26, 2007
Applicants:

See Leang Chin, Quebec, CA;

Jean-françois Daigle, Quebec, CA;

Weiwei Liu, Tianjin, CN;

Inventors:

See Leang Chin, Quebec, CA;

Jean-François Daigle, Quebec, CA;

Weiwei Liu, Tianjin, CN;

Assignee:

Université Laval, Québec, CA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 3/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

There is described a method for identifying at least one target in a substantially transparent medium. High-power, ultra-short laser pulses are transmitted into the medium. A diameter of the laser pulses is enlarged and the laser pulses having an enlarged beam diameter are focused using a focusing element so as to generate filaments substantially near a geometrical focal zone of the focusing element, whereby a spontaneous fluorescence signal (amplified through amplified spontaneous emission or not) is detected and analyzed to identify the target.


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