The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2010
Filed:
Oct. 17, 2007
Shinichiro Hirai, Saitama, JP;
Yoshinori Ohsaki, Utsunomiya, JP;
Yoshiyuki Kuramoto, Utsunomiya, JP;
Shinichiro Hirai, Saitama, JP;
Yoshinori Ohsaki, Utsunomiya, JP;
Yoshiyuki Kuramoto, Utsunomiya, JP;
Canon Kabushiki Kaisha, , JP;
Abstract
A projection exposure apparatusprojects the pattern of an originalonto a substratevia a projection optical system PL. The projection exposure apparatusincludes an original stagewhich holds the original, a substrate stagewhich holds the substrate, and a measurement unit. The measurement unit includes a Fizeau interferometer IF including an optical unitand mirror. The optical unitincludes a Fizeau surface which splits a light beam into a reference light beam and a test light beam. The mirrorreflects the test light beam having passed through the projection optical system PL. The optical unitis mounted on the original stage. The mirroris mounted on the substrate stage
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile