The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 31, 2010

Filed:

Sep. 07, 2005
Applicants:

Mark Evan Cerny, Los Angeles, CA (US);

Pal-kristian Engstad, Los Angeles, CA (US);

Inventors:

Mark Evan Cerny, Los Angeles, CA (US);

Pal-Kristian Engstad, Los Angeles, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 15/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and method for environment mapping determines a computer-generated object's reflective appearance, based upon position and orientation of a camera with respect to the object's location. An embodiment of the present invention is implemented as a real-time environment mapping for polygon rendering, however, the scope of the invention covers other rendering schemes. According to one embodiment of the present invention, a vector processing unit (VPU) uses a modified reflection formula—r=e−(e·(n+e))(n+e)/(1−nz)=e−(e·[nx, ny, nz−1])[nx, ny, nz−1]/(1−nz), wherein e=[0,0,−1], and nx, ny, and nz are the components of the surface normal vector n—to compute reflective properties of an object.


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