The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2010
Filed:
Apr. 28, 2006
Masahiro Fujiwara, Tokyo, JP;
Kenji Doi, Tokyo, JP;
Yoshifumi Araki, Tokyo, JP;
Kazuyoshi Yamazawa, Tokyo, JP;
Masahiro Fujiwara, Tokyo, JP;
Kenji Doi, Tokyo, JP;
Yoshifumi Araki, Tokyo, JP;
Kazuyoshi Yamazawa, Tokyo, JP;
Asahi Kasei Chemicals Corporation, Tokyo, JP;
Abstract
The present invention relates to a photosensitive resin composition comprising at least a thermoplastic elastomer (a), a photopolymerizable unsaturated monomer (b), and a photopolymerization initiator (c), characterized in that the thermoplastic elastomer (a) comprises at least vinyl aromatic hydrocarbon units, butadiene units, and alkylene units and contains alkylene units not less than 5 wt % and not more than 80 wt % with respect to the total amount of butadiene units and alkylene units. The present invention provides a photosensitive resin composition that simultaneously achieves excellent fine line reproducibility, ester solvent resistance, and prevention of cracks occurring on plate surface.