The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 31, 2010

Filed:

Apr. 02, 2007
Applicants:

Feng-yuan Zhang, Newark, DE (US);

Ajay K. Prasad, Newark, DE (US);

Suresh Advani, Newark, DE (US);

Inventors:

Feng-Yuan Zhang, Newark, DE (US);

Ajay K. Prasad, Newark, DE (US);

Suresh Advani, Newark, DE (US);

Assignee:

University of Delaware, Newark, DE (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01M 2/00 (2006.01); H01M 4/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to novel methods for producing a nano-porous gas diffusion media, compositions thereof, and devices comprising the same. The nano-porous gas diffusion media of the invention is produced using photolithographic techniques to create a solid substrate comprising a plurality of nano-scale (1 nm-300 μm) pores or holes that allow for the diffusion or exchange of molecules, gases, and/or liquids through the substrate. The nano-porous diffusion media of the invention also displays superior electro- and thermal conductivity, and increased durability and performance. In some embodiments, the nano-porous diffusion media of the invention is also coated with a self-assembling monolayer (SAM) of organic molecules to further improve its physical characteristics.


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