The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2010
Filed:
Dec. 12, 2007
Hai Sun, Milpitas, CA (US);
Liubo Hong, San Jose, CA (US);
Hongping Yuan, Fremont, CA (US);
Yizhong Wang, Woodbury, MN (US);
Winnie Yu, San Jose, CA (US);
Xianzhong Zeng, Fremont, CA (US);
Hai Sun, Milpitas, CA (US);
Liubo Hong, San Jose, CA (US);
Hongping Yuan, Fremont, CA (US);
Yizhong Wang, Woodbury, MN (US);
Winnie Yu, San Jose, CA (US);
Xianzhong Zeng, Fremont, CA (US);
Western Digital (Fremont), LLC, Fremont, CA (US);
Abstract
A method and system for fabricating a magnetic recording device are described. The method and system include providing a mask layer on the magnetic recording device and imprinting a pattern in the mask layer to form a mask. The method and system also include transferring the pattern from the mask to the magnetic recording device. In another aspect, the method and system include providing a malleable mask layer on the magnetic recording device. In this aspect, the method and system also include depressing an imprint mask into the mask layer and curing the mask layer while the imprint mask is depressed into the mask layer to provide a mask having a pattern. The pattern may correspond to a read sensor and/or a perpendicular magnetic recording pole. The method and system also include transferring the pattern from the mask to the magnetic recording device.