The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2010
Filed:
Mar. 14, 2002
Yoshiyuki Nabata, Tochigi, JP;
Takeshi Nakajima, Togichi, JP;
Hidehiko Nakayama, Tochigi, JP;
Masayasu Sato, Tochigi, JP;
Takashi Kawai, Tochigi, JP;
Mitsuo Shimizu, Tokyo, JP;
Yoshiyuki Nabata, Tochigi, JP;
Takeshi Nakajima, Togichi, JP;
Hidehiko Nakayama, Tochigi, JP;
Masayasu Sato, Tochigi, JP;
Takashi Kawai, Tochigi, JP;
Mitsuo Shimizu, Tokyo, JP;
Kao Corporation, Tokyo, JP;
Abstract
A process for producing a cosmetic-impregnated sheet which comprises applying and infiltrating a cosmetic base to and into a base sheet having on the surface thereof a retentive sheet capable of absorbing and retaining the cosmetic base at a shear rate of 10to 10s, the cosmetic base being applied to and infiltrated into the retentive sheet of the base sheet, and the cosmetic base, when subjected to a steady shear deformation at a shear rate of 2 sfor 100 seconds followed by a steady shear deformation at a stepwise increased shear rate of 20 s, showing no shear stress growth or showing such a shear stress growth that the difference between the peak shear stress B at a shear rate of 20 sand the equilibrium shear stress A at the same shear rate, B−A, is 20% or smaller of the equilibrium shear stress A in the transition between the two shear rates.