The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2010
Filed:
Feb. 05, 2008
Wen-feng Cheng, Ping-Zhen Industrial Park, TW;
Chao-ying Lin, Ping-Zhen Industrial Park, TW;
Chen-sheng Lee, Ping-Zhen Industrial Park, TW;
Tsung-chang Yang, Ping-Zhen Industrial Park, TW;
Wen-Feng Cheng, Ping-Zhen Industrial Park, TW;
Chao-Ying Lin, Ping-Zhen Industrial Park, TW;
Chen-Sheng Lee, Ping-Zhen Industrial Park, TW;
Tsung-Chang Yang, Ping-Zhen Industrial Park, TW;
Entire Technology Co., Ltd., Taoyuan County, TW;
Abstract
The invention provides a diffusion plate and a backlight module. The backlight module includes pluralities of light sources, a reflector and a first diffusion plate. The light sources, which are disposed in the reflector, are spatially arranged. The first diffusion plate is disposed on the light sources. There are pluralities of bar-shaped first patterns and second patters, which are arranged in the alternating way, disposed on the emission surface of the first diffusion plate. The contours of first patterns and second patterns are arc shaped. The height of first patterns is H1, and the width is W1. The height of second patterns is H2, and the width is W2. The value of H1/W1 is between 0.4 and 1. The ratio of H2/W2 versus H1/W1 is between 0.6 and 0.9.