The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2010
Filed:
May. 31, 2005
Applicants:
Yojiro Kojima, Tokyo, JP;
Hiroyuki Ogino, Yokohama, JP;
Takayuki Ishikawa, Inba-gun, JP;
Takao Yamamoto, Yokohama, JP;
Inventors:
Yojiro Kojima, Tokyo, JP;
Hiroyuki Ogino, Yokohama, JP;
Takayuki Ishikawa, Inba-gun, JP;
Takao Yamamoto, Yokohama, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Gas resistance of an image is evaluated by placing the image in a mixed gas atmosphere containing at least ozone and nitrogen dioxide. The mixed gas atmosphere is controlled such that the concentrations of ozone and nitrogen dioxide are not less than 75 ppb and not less than 150 ppb, respectively, and the mixed gas is continuously supplied to the surface of a sample bearing the image at a flow rate not less than 0.2 m/s and not more than 3.0 m/s.