The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7782469 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 24, 2010

Filed:

Nov. 29, 2007
Applicant:

Jong Bae Kim, Daejeon, KR;

Inventor:

Jong Bae Kim, Daejeon, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 9/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided is a method for determining the optimal resonant length, among a large number of local resonant lengths which satisfy a resonant condition, that maximizes wave intensity in a resonant structure. In the second harmonic generation or the cascaded difference frequency generation device using the resonant structure by which the second harmonic wave of a pump wave resonates, the optimal resonant length is determined so that the intensity of an optical wave is maximized. The intensity distribution of the optical wave is defined, according to the resonant feedback condition or the no-resonant feedback condition, as a function of the resonant lengths to determine the optimal resonant length.


Find Patent Forward Citations

Kim, Jong. (2010). Method for determining optimal resonant length to maximize wave intensity in resonant structure (U.S. Patent No. 7782469). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7782469

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