The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2010
Filed:
Apr. 18, 2008
E. Mark Haacke, Grosse Pointe Farms, MI (US);
Jaladhar Neelavalli, Detroit, MI (US);
Yu-chung Norman Cheng, Northville, MI (US);
E. Mark Haacke, Grosse Pointe Farms, MI (US);
Jaladhar Neelavalli, Detroit, MI (US);
Yu-Chung Norman Cheng, Northville, MI (US);
MR Innovations, Inc., Detroit, MI (US);
Abstract
The present invention provides a method of handling rapid phase aliasing in magnetic resonance images arising from local magnetic susceptibility differences. The methods of the present invention can be used to estimate the field effects within an object arising from the interfaces of regions having differences in magnetic susceptibilities, and to subtract out the resulting phase from the original or source phase data prior to any further phase processing. The methods of the present invention also include a process of accurately determining the susceptibility values of multiple voxel regions based on the geometry of such regions.