The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2010
Filed:
Feb. 27, 2007
Yang-ho Woo, Busan, KR;
Ta-kwan Woo, Busan, KR;
Yang-Ho Woo, Busan, KR;
Ta-Kwan Woo, Busan, KR;
Sungil Co., Ltd. (SIM), Busan, KR;
Abstract
A system for forming gas hydrates includes a reactor adapted to receive a hydrate-forming fluid and a reaction fluid and react the hydrate-forming and reaction fluids within a reverse micellar solution to form gas hydrate particles; and a gas hydrate removal system coupled to the reactor, the gas hydrate removal system adapted to receive the gas hydrate particles within the reverse micellar solution and transport the gas hydrate particles away from the reactor. The gas hydrate removal system is adapted to transport gas hydrate particles away from the reactor concurrently with the formation of gas hydrate particles within the reactor.