The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2010
Filed:
Jan. 03, 2007
Joshua Goldberger, North Canton, OH (US);
Melissa Fardy, Berkeley, CA (US);
Oded Rabin, San Francisco, CA (US);
Allon Hochbaum, Berkeley, CA (US);
Minjuan Zhang, Ann Arbor, MI (US);
Peidong Yang, El Cerrito, CA (US);
Joshua Goldberger, North Canton, OH (US);
Melissa Fardy, Berkeley, CA (US);
Oded Rabin, San Francisco, CA (US);
Allon Hochbaum, Berkeley, CA (US);
Minjuan Zhang, Ann Arbor, MI (US);
Peidong Yang, El Cerrito, CA (US);
Abstract
A method for the non-catalytic growth of nanowires is provided. The method includes a reaction chamber with the chamber having an inlet end, an exit end and capable of being heated to an elevated temperature. A carrier gas with a flow rate is allowed to enter the reaction chamber through the inlet end and exit the chamber through the exit end. Upon passing through the chamber the carrier gas comes into contact with a precursor which is heated within the reaction chamber. A collection substrate placed downstream from the precursor allows for the formation and growth of nanowires thereon without the use of a catalyst. A second embodiment of the present invention is comprised of a reaction chamber, a carrier gas, a precursor target, a laser beam and a collection substrate. The carrier gas with a flow rate and a gas pressure is allowed to enter the reaction chamber through an inlet end and exit the reaction chamber through the exit end. The laser beam is focused on the precursor target which affords for the evaporation of the precursor material and subsequent formation and growth of nanowires on the collection substrate.