The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2010
Filed:
Mar. 30, 2007
Kyong-rim Kang, Gyeonggi-do, KR;
Sun-yul Ahn, Gyeonggi-do, KR;
Young-ho Kim, Gyeonggi-do, KR;
Jae-hyun Kim, Gyeonggi-do, KR;
Joo-hyung Yang, Gyeonggi-do, KR;
Tae-sung Kim, Gyeonggi-do, KR;
Kyong-Rim Kang, Gyeonggi-do, KR;
Sun-Yul Ahn, Gyeonggi-do, KR;
Young-Ho Kim, Gyeonggi-do, KR;
Jae-Hyun Kim, Gyeonggi-do, KR;
Joo-Hyung Yang, Gyeonggi-do, KR;
Tae-Sung Kim, Gyeonggi-do, KR;
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
A polymer resin composition, a method for forming a pattern using the polymer resin composition, and a method for fabricating a capacitor using the polymer resin composition are disclosed. The polymer resin composition includes about 75 to 93 percent by weight of a copolymer prepared from benzyl methacrylate, methacrylic acid, and hydroxyethyl methacrylate; about 1 to 7 percent by weight of a cross-linking agent; about 0.01 to 0.5 percent by weight of a thermal acid generator; about 0.01 to 1 percent by weight of a photoacid generator; about 0.00001 to 0.001 percent by weight of an organic base; and a solvent.