The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2010
Filed:
Jan. 27, 2006
Jinlian HU, Hong Kong, CN;
Wenguang Liu, Hong Kong, CN;
Baohua Liu, Hong Kong, CN;
The Hong Kong Polytechnic University, Hong Kong, CN;
Abstract
This invention involves fabric-supported chitosan modified temperature responsive PNIPAAm/PU hydrogel and the use thereof in preparation of facial mask. The merit of this invention is the hydrogel formed can reversibly swell and deswell near body temperature; the incorporation of PU can suppress the syneresis of PNIPAAm at an elevated temperature; Grafting of PNIPAAm and PU onto the surface of cellulose fabrics can enhance the mechanical strength of hydrogel; Coupling of chitosan to the surface of hydrogel can not only improve the handle and skin affinity, but also render the facial mask antibacterial; The hydrogel is capable of loading a variety of nutrients (or other functional components), which can release at body temperature; the hydrogel facial mask can be reusable with repeated rinsing.