The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2010
Filed:
Mar. 09, 2009
Yuichiro Imanishi, Nagoya, JP;
Shinichi Miwa, Nagoya, JP;
Fumio Abe, Nagoya, JP;
Yukio Miyairi, Nagoya, JP;
Yuichiro Imanishi, Nagoya, JP;
Shinichi Miwa, Nagoya, JP;
Fumio Abe, Nagoya, JP;
Yukio Miyairi, Nagoya, JP;
NGK Insulators, Ltd., Nagoya, JP;
Honda Motor Co., Ltd., Tokyo, JP;
Abstract
In the plasma reaction vessel () of the invention, two or more laminate-structures () having ceramic formed bodies () in which a plasma generating electrode () capable of generating plasma is formed in two-tape-form, and an electrically continuous film-like electrically conductive electrode () held between the two ceramic formed bodies () are formed in such a manner as to form a plasma generating space () containing mutual laminate planes therein. Of the electrically conductive electrodes (), adjacent ones are capable of having electric discharge produced therebetween so as to generate the plasma in the plasma generating space () and of generating uniform stabilized plasma at low electric power, it being possible to reduce a passage resistance to a gas passing therein.