The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 24, 2010

Filed:

Dec. 05, 2006
Applicants:

Masao Tamada, Takasaki, JP;

Noriaki Seko, Takasaki, JP;

Eiji Sakata, Fukuchi-machi, JP;

Naoki Itoh, Fukuchi-machi, JP;

Inventors:

Masao Tamada, Takasaki, JP;

Noriaki Seko, Takasaki, JP;

Eiji Sakata, Fukuchi-machi, JP;

Naoki Itoh, Fukuchi-machi, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01B 1/02 (2006.01); H05K 3/38 (2006.01); B32B 15/082 (2006.01);
U.S. Cl.
CPC ...
Abstract

The high-frequency substrate is constructed of a base member and a conductor adhered to the base member, and the base member is composed of a polymer which is a fluoropolymer having a conductor-affinitive monomer graftpolymerized at a grafting percentage of 1% or less by weight. After reactive sites necessary for graftpolymerization are formed on a film of a fluoropolymer under an oxygen-free atmosphere by irradiating the film with an electron beam or the like, the fluoropolymer film is introduced into a solution of a conductor-affinitive monomer so as to cause graftpolymerization, and a conductor is adhered thereto to thereby produce a substrate, with a grafting percentage of the monomer to the fluoropolymer being 1% or less by weight in the graftpolymerization. The technique leads to the production of a high-frequency substrate having superior adhesion force with respect to the conductor.


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