The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2010
Filed:
Aug. 03, 2005
Shinji Nakasato, Isehara, JP;
Yasuhisa Inao, Kawasaki, JP;
Shinji Nakasato, Isehara, JP;
Yasuhisa Inao, Kawasaki, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A near-field exposure apparatus for exposing a substrate to light via an exposure mask under a condition that the exposure mask is close to the substrate. The apparatus includes a pressure adjustable container to control a relative position of the exposure mask to the substrate by adjusting a pressure of the pressure adjustable container. The pressure adjustable container has a structure adapted to be tightly closed with the exposure mask being held mounted so as to prevent volatile substances or foreign substances from entering into the pressure adjustable container. The pressure of the pressure adjustable container is adjustable through a change in capacity of the pressure adjustable container.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile