The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2010
Filed:
Jun. 03, 2008
Yong-kyu Lee, Gyeonggi-do, KR;
Jeong-uk Han, Gyeonggi-do, KR;
Hee-seog Jeon, Gyeonggi-do, KR;
Young-ho Kim, Gyeonggi-do, KR;
Myung-jo Chun, Gyeonggi-do, KR;
Jung-ho Moon, Seoul, KR;
Yong-Kyu Lee, Gyeonggi-do, KR;
Jeong-Uk Han, Gyeonggi-do, KR;
Hee-Seog Jeon, Gyeonggi-do, KR;
Young-Ho Kim, Gyeonggi-do, KR;
Myung-Jo Chun, Gyeonggi-do, KR;
Jung-Ho Moon, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-Si, KR;
Abstract
A mask read-only memory (ROM) device, which can stably output data, includes an on-cell and an off-cell. The on-cell includes an on-cell gate structure on a substrate and an on-cell junction structure within the substrate. The off-cell includes an off-cell gate structure on the substrate and an off -cell junction structure within the substrate. The on-cell gate structure includes an on-cell gate insulating film, an on-cell gate electrode and an on-cell gate spacer. The on-cell junction structure includes first and second on-cell ion implantation regions of a first polarity and third and fourth on-cell ion implantation regions of a second polarity. The off-cell gate structure includes an off-cell gate insulating film, an off-cell gate electrode and an off-cell gate spacer. The off-cell junction structure includes first and second off-cell ion implantation regions of the first polarity and a third off-cell ion implantation region of the second polarity.