The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2010
Filed:
Sep. 21, 2005
Seiji Satoh, Tokyo, JP;
Hidehiko Sekizawa, Tokyo, JP;
Seiji Satoh, Tokyo, JP;
Hidehiko Sekizawa, Tokyo, JP;
Sony Corporation, Tokyo, JP;
Abstract
A method to manufacture a divided waveplate filter by laser irradiation. A material layer is formed on the surface of a substrate material. A laser oscillator programmed to form a predetermined pattern scans light to form the divided waveplates. In some embodiments, the divided waveplate material layer may be selectively removed by laser ablation. In some embodiments, the material layer has a phase-difference characteristic and the divided waveplates may be formed by removing the phase-difference characteristic of the material layer using laser light without removing the material layer itself. The material layer may be covered by a laser absorbing layer such as titanium oxide. The divided waveplate may be protected by covering the entire surface with a protective layer 6.