The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2010
Filed:
Dec. 04, 2007
Francesco Lemmi, Sunnyvale, CA (US);
Elena V. Rogojina, Los Altos, CA (US);
Pingrong Yu, Sunnyvale, CA (US);
David Jurbergs, Austin, TX (US);
Homer Antoniadis, Mountain View, CA (US);
Maxim Kelman, Mountain View, CA (US);
Francesco Lemmi, Sunnyvale, CA (US);
Elena V. Rogojina, Los Altos, CA (US);
Pingrong Yu, Sunnyvale, CA (US);
David Jurbergs, Austin, TX (US);
Homer Antoniadis, Mountain View, CA (US);
Maxim Kelman, Mountain View, CA (US);
Innovalight, Inc., Santa Clara, CA (US);
Abstract
A method of forming a densified nanoparticle thin film is disclosed. The method includes positioning a substrate in a first chamber; and depositing a nanoparticle ink, the nanoparticle ink including a set of Group IV semiconductor particles and a solvent. The method also includes heating the nanoparticle ink to a first temperature between about 30° C. and about 300° C., and for a first time period between about 1 minute and about 60 minutes, wherein the solvent is substantially removed, and a porous compact is formed; and positioning the substrate in a second chamber, the second chamber having a pressure of between about 1×10Torr and about 1×10Torr. The method further includes depositing on the porous compact a dielectric material; wherein the densified nanoparticle thin film is formed.