The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 17, 2010

Filed:

Jun. 02, 2004
Applicants:

Kenichi Nagayama, Tsurugashima, JP;

Tatsuya Yoshizawa, Tsurugashima, JP;

Masahiro Shiratori, Tsurugashima, JP;

Inventors:

Kenichi Nagayama, Tsurugashima, JP;

Tatsuya Yoshizawa, Tsurugashima, JP;

Masahiro Shiratori, Tsurugashima, JP;

Assignee:

Pioneer Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 51/40 (2006.01);
U.S. Cl.
CPC ...
Abstract

An organic semiconductor device in which an organic semiconductor layer is easily formed into a pattern, and a method of manufacturing same. On a substrate, a first structural portion including a first electrode, an organic semiconductor layer made of an organic compound having a semiconductor property, and a second structural portion having a second electrode are provided in order. The second structural portion is formed in a prescribed pattern. The second structural portion includes a mask portion having an etching-resistant property, and etching of the organic semiconductor layer is performed while using the mask portion as a mask. The mask portion may be the second electrode.


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