The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 17, 2010

Filed:

Aug. 26, 2009
Applicants:

Chun-hao Tung, Taoyuan, TW;

Chia-tsung Lee, Taoyuan, TW;

Hsien-kai Tseng, Taoyuan, TW;

Shigekazu Horino, Taoyuan, TW;

Inventors:

Chun-Hao Tung, Taoyuan, TW;

Chia-Tsung Lee, Taoyuan, TW;

Hsien-Kai Tseng, Taoyuan, TW;

Shigekazu Horino, Taoyuan, TW;

Assignee:

Au Optronic Corp., Hsinchu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A mask including a transparent substrate, a non-transmitting layer, a first transmitting layer and a second transmitting layer is provided. The transparent substrate has a first region, a second region, and a third region. The non-transmitting layer is disposed in the first region of the transparent substrate. The first transmitting layer is disposed in the second region and the third region of the transparent substrate. The second transmitting layer is disposed on the first transmitting layer in the third region.


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