The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 17, 2010

Filed:

Sep. 15, 2004
Applicants:

Hong Yee Low, Singapore, SG;

Suresh Parappuveetil Sarangadharan, Singapore, SG;

Yen Peng Kong, Irvine, CA (US);

Karan Darmono, Singapore, SG;

Inventors:

Hong Yee Low, Singapore, SG;

Suresh Parappuveetil Sarangadharan, Singapore, SG;

Yen Peng Kong, Irvine, CA (US);

Karan Darmono, Singapore, SG;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 35/08 (2006.01); B29C 43/02 (2006.01); B32B 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

There is disclosed an imprinted polymer support for solid phase organic synthesis (SPOS). The polymer support being obtainable from a method that comprises providing a substrate and a mold, the mold having a defined surface pattern. A composition is placed between the defined surface pattern of the mold and the substrate. The composition comprises a polymerisation medium with at least one functional monomer and a free radical initiator. The composition is polymerised to form an array of polymer imprints adhered to the substrate.


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