The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 17, 2010

Filed:

Mar. 27, 2007
Applicant:

Akira Tsukamoto, Osaka, JP;

Inventor:

Akira Tsukamoto, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a method for forming a lens according to the present invention, a digging step of digging a depression includes a depositing substep of depositing a pattern film on a surface of a base film, the pattern film being made of a second material and in an inverted shape of the depression, a forming substep of forming an embedding film to flatten the surface of the pattern film, the embedding film being made of a third material and embedding therein the pattern film, and an etch-back substep of conducting etch-back on a surface of the embedding film toward the base film to dig the depression, and an etch rate of the second material is higher than an etch rate of the third material.


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