The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7774920 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 17, 2010

Filed:

Apr. 25, 2007
Applicants:

Tao Deng, Niskayuna, NY (US);

Francisco Arias, Mason, OH (US);

Rustem F. Ismagilov, Chicago, IL (US);

Paul J. A. Kenis, Champaign, IL (US);

George M. Whitesides, Newton, MA (US);

Inventors:

Tao Deng, Niskayuna, NY (US);

Francisco Arias, Mason, OH (US);

Rustem F. Ismagilov, Chicago, IL (US);

Paul J. A. Kenis, Champaign, IL (US);

George M. Whitesides, Newton, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B21B 1/46 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of forming microstructures. An article including a metal atom precursor is disproportionally exposed to electromagnetic radiation in an amount and intensity sufficient to convert some of the precursor to elemental metal. Additional conductive material may then be deposited onto the elemental metal to produce a microstructure.


Find Patent Forward Citations

Deng, Tao. (2010). Fabrication of metallic microstructures via exposure of photosensitive compostion (U.S. Patent No. 7774920). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7774920

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