The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2010
Filed:
Jun. 11, 2009
Applicants:
Shi-wei Chu, Taipei, TW;
Jiun-yann Yu, Taipei, TW;
Inventors:
Shi-Wei Chu, Taipei, TW;
Jiun-Yann Yu, Taipei, TW;
Assignee:
National Taiwan University, Taipei, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention is a scanning system having spherical mirrors to operate a two-dimensional scanning. Aberration owing to oblique incident light is compensated to reach diffraction limit. With proper metallic coating, the present invention uses a wavelength from ultra-violet light to tera-hertz wavelength
Chu, Shi-Wei. (2010). Reflective optical scanning system having minimized aberration (U.S. Patent No. 7773278). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7773278
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile