The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2010
Filed:
Oct. 30, 2006
Florian Ciurea, San Jose, CA (US);
Alexander Berestov, San Jose, CA (US);
Tatsuya Deguchi, Kawasaki, JP;
Naoya Katoh, Ichikawa, JP;
Florian Ciurea, San Jose, CA (US);
Alexander Berestov, San Jose, CA (US);
Tatsuya Deguchi, Kawasaki, JP;
Naoya Katoh, Ichikawa, JP;
Sony Corporation, Tokyo, JP;
Sony Electronics Inc., Park Ridge, NJ (US);
Abstract
A method of evaluating halo artifacts is described herein. The method utilizes a pattern of color patches, a color space and color difference metrics to analyze color changes which correlate to the amount of halo. The pattern of color patches is utilized in the CIE L*a*b* color space to determine an area of patch unaffected by halo of the pattern of color patches. After the area of patch unaffected by halo is determined, a Reference Value is computed by averaging the CIE L*a*b* color for the area of patch unaffected by halo. Then an Artifact Value is calculated either by averaging the CIE L*a*b* color for the area outside the area of patch unaffected by halo but before the margin or by averaging the CIE L*a*b* color on the edge of the patch. Once these values are determined, the halo quantity is calculated.