The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2010
Filed:
Mar. 19, 2007
Applicants:
Wei LI, Princeton, NJ (US);
Daphne Yu, Yardley, PA (US);
Assignee:
Siemens Medical Solutions USA, Inc., Malvern, PA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Rendering with a punching mask is performed without voxelization. A plurality of sub-volumes are identified as a function of the punching mask. The sub-volumes are generally layered in range. Each sub-volume is rendered separately or independently. The renderings from multiple passes or sub-volumes are composited together.
Li, Wei. (2010). Range-peeling for punching masks in volume rendering (U.S. Patent No. 7773086). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7773086
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile