The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2010
Filed:
Jan. 11, 2006
David G. Grier, New York, NY (US);
Ritesh Agarwal, Philadelphia, PA (US);
Guihua Yu, Cambridge, MA (US);
Charles M. Lieber, Cambridge, MA (US);
Kosta Ladavac, Ridgefield, CT (US);
Yael Roichman, New York, NY (US);
David G. Grier, New York, NY (US);
Ritesh Agarwal, Philadelphia, PA (US);
Guihua Yu, Cambridge, MA (US);
Charles M. Lieber, Cambridge, MA (US);
Kosta Ladavac, Ridgefield, CT (US);
Yael Roichman, New York, NY (US);
New York University, New York, NY (US);
Harvard University, Cambridge, MA (US);
Abstract
A system and method for manipulating and processing nanowires in solution with arrays of holographic optical traps. The system and method of the present invention is capable of creating hundreds of individually controlled optical traps with the ability to manipulate objects in three dimensions. Individual nanowires with cross-sections as small as 20 nm and lengths exceeding 20 μm are capable of being isolated, translated, rotated and deposited onto a substrate with holographic optical trap arrays under conditions where single traps have no discernible influence. Spatially localized photothermal and photochemical processes induced by the well-focused traps can also be used to melt localized domains on individual nanowires and to fuse nanowire junctions.