The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2010
Filed:
Jun. 05, 2008
Applicant:
Jae Chang Jung, Seoul, KR;
Inventor:
Jae Chang Jung, Seoul, KR;
Assignee:
Hynix Semiconductor Inc., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/38 (2006.01); C08F 16/38 (2006.01); C08F 16/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
A polymer for crosslinking an anti-reflective film has a high refractive index. An anti-reflective composition containing the polymer for crosslinking is useful in an immersion lithography process using ArF (193 nm) of a semiconductor device manufacturing process.
Jung, Jae. (2010). Anti-reflective polymer, anti-reflective composition containing the same, and method for forming pattern using the same (U.S. Patent No. 7771920). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7771920
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