The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7771897 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 10, 2010

Filed:

Mar. 14, 2007
Applicant:

Takamitsu Furukawa, Tokyo, JP;

Inventor:

Takamitsu Furukawa, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01); G03F 9/00 (2006.01); G03C 5/00 (2006.01); G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method includes; a step of setting square mask cells in rows and columns on a transparent mask-substrate surface by demarcating by orthogonal lines of equal intervals, each of which has one side having a length smaller than a resolution limit of an optical system; a step of setting the resist thicknesses corresponding to the mask cells; a step of assigning normalized light-intensities respectively to the mask cells as transmission intensities, corresponding to the film thicknesses and having three or more different values; a step of setting each of the mask cells a light-transmission area and a shade-area and determining a transmission-light intensity by an transmission area ratio; a step of providing shade films on the shade areas of the mask substrate.


Find Patent Forward Citations

Furukawa, Takamitsu. (2010). Photomask for forming a resist pattern and manufacturing method thereof, and resist-pattern forming method using the photomask (U.S. Patent No. 7771897). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7771897

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