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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7771789 B1

PDFFull Text
Expired
Date of Patent:
Aug. 10, 2010

Filed:

Jan. 04, 2006

Method of forming mask and mask

Applicants:

Shinichi Yotsuya, Chino, JP;

Hiroshi Koeda, Suwa, JP;

Takayuki Kuwahara, Chino, JP;

Tadayoshi Ikehara, Suwa, JP;

Inventors:

Shinichi Yotsuya, Chino, JP;

Hiroshi Koeda, Suwa, JP;

Takayuki Kuwahara, Chino, JP;

Tadayoshi Ikehara, Suwa, JP;

Assignee:

Seiko Epson Corporation, , JP;

Attorney:

Harness, Dickey & Pierce, P.L.C.

Primary Examiner:

Timothy Meeks

Assistant Examiner:

Kelly M Gambetta

Int. Cl.
CPC ...
C23C 16/00 (2006.01); B05D 5/12 (2006.01); B05D 1/32 (2006.01); B05D 3/00 (2006.01); B41N 1/24 (2006.01); B29C 35/08 (2006.01); H01F 1/00 (2006.01); H05B 6/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of forming a mask, in which a film pattern is formed on a substrate by using a mask, includes sequentially arranging the mask, the substrate and a first member having a flat surface contacting with the substrate in this order from a supply source of film forming material; and attracting the mask and the first member by means of a magnetic force.

Find Patent Forward Citations

Yotsuya, Shinichi. (2010). Method of forming mask and mask (U.S. Patent No. 7771789). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7771789

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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