The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2010
Filed:
Dec. 16, 2003
Stephan Claude DE LA Veaux, Wilmington, DE (US);
LU Zhang, Newark, DE (US);
Stephan Claude De La Veaux, Wilmington, DE (US);
Lu Zhang, Newark, DE (US);
E. I. du Pont de Nemours and Company, Wilmington, DE (US);
Abstract
The present invention provides a method and apparatus for the controlled synthesis of nanoparticles using a high temperature process. The reactor chamber includes a high temperature gas heated by means such as a plasma torch, and a reaction chamber. The homogenizer includes a region between the reactant inlets and the plasma (the spacer zone) to ensure that feeds from the reactant inlets are downstream of the recirculation zone induced by the high temperature gas. It also includes a region downstream of the reactant inlets that provides a nearly I dimensional (varying only in the axial direction) flow and concentration profile in the reaction zone to produce nanoparticles with narrow size distribution.