The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2010
Filed:
Jun. 28, 2006
Yoshiyuki Kamata, Tokyo, JP;
Katsuyuki Naito, Tokyo, JP;
Akira Kikitsu, Yokohama, JP;
Masatoshi Sakurai, Tokyo, JP;
Masahiro Oka, Ichihara, JP;
Yoshiyuki Kamata, Tokyo, JP;
Katsuyuki Naito, Tokyo, JP;
Akira Kikitsu, Yokohama, JP;
Masatoshi Sakurai, Tokyo, JP;
Masahiro Oka, Ichihara, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Showa Denko K.K., Tokyo, JP;
Abstract
According to one embodiment, a method for manufacturing a magnetic recording medium includes forming patterns having protrusions and recesses of a ferromagnetic material onto a recording track section and a servo section on a substrate, forming a flattening film, a top surface of which is higher than that of the protrusion of the ferromagnetic material, onto the ferromagnetic material, and performing ion beam etching onto the flattening film up to a top surface of the protrusion of the ferromagnetic material, and determining an end point of flattening etching on the basis of a change in the total number of incident particles by means of an ion counter installed so as to be at an angle θ with respect to a perpendicular direction to the substrate in accordance with a material of the flattening film.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile