The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2010
Filed:
Jul. 13, 2004
Jürgen Ulrich, Schöneck, DE;
Peter Sauer, Schluchtern, DE;
Jürgen Ulrich, Schöneck, DE;
Peter Sauer, Schluchtern, DE;
Applied Materials GmbH & Co. KG, Alzenau, DE;
Abstract
A sputtering cathode () for coating processes in a vacuum chamber () comprises one at least single-piece target plate () mounted on a metallic diaphragm (). On the side of the diaphragm () facing away from the target plate () is disposed a cooling agent channel with an inflow line () and an outflow line () for a cooling agent and a hollow space () for at least one magnet system (). The magnet system () is disposed in a supporting tub () sealed against the diaphragm () and not exposed to the cooling agent. The entire configuration is disposed on a supporting structure (). In order to improve the heat transfer from the target plate () to the cooling agent in simple, efficient and cost-effective manner and to avoid the hazard of the cooling agent penetrating into the vacuum chamber, the invention provides that