The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2010
Filed:
Dec. 20, 2004
Andrei Burago, Kirkland, WA (US);
Christoph E. Ammann, Sammamish, WA (US);
Sergey Genkin, Kirkland, WA (US);
Eliyezer Kohen, Mercer Island, WA (US);
Victor Kozyrev, Issaquah, WA (US);
Anton A. Sukhanov, Bellevue, WA (US);
Igor Zverev, Redmond, WA (US);
Andrei Burago, Kirkland, WA (US);
Christoph E. Ammann, Sammamish, WA (US);
Sergey Genkin, Kirkland, WA (US);
Eliyezer Kohen, Mercer Island, WA (US);
Victor Kozyrev, Issaquah, WA (US);
Anton A. Sukhanov, Bellevue, WA (US);
Igor Zverev, Redmond, WA (US);
Microsoft Corporation, Redmond, WA (US);
Abstract
A method and computer-readable medium are provided for optimized paragraph layout. According to the method, a line-by-line paragraph layout is generated determine a maximum penalty for a paragraph. One or more layout nodes may be generated that include data representing a possible layout of the paragraph to a point within a backing store and identifying any changes to a geometry of the page caused by the layout of the paragraph defined by the layout node. A penalty is also calculated for each of the layout nodes. Each layout node that has a penalty less than the maximum penalty calculated during the line-by-line formatting processing is added to the node pool. This process repeats until only a single layout node remains in the node pool that represents the entire paragraph of text.