The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2010
Filed:
Jun. 14, 2006
Motonori Ishii, Osaka, JP;
Kazutoshi Onozawa, Osaka, JP;
Toshinobu Matsuno, Kyoto, JP;
Takanori Yogo, Kyoto, JP;
Kimiaki Toshikiyo, Osaka, JP;
Motonori Ishii, Osaka, JP;
Kazutoshi Onozawa, Osaka, JP;
Toshinobu Matsuno, Kyoto, JP;
Takanori Yogo, Kyoto, JP;
Kimiaki Toshikiyo, Osaka, JP;
Panasonic Corporation, Osaka, JP;
Abstract
The present invention provides a method of manufacturing a lens, in which the method includes exposing a photoresist to light using a phase shift mask. Here, the phase shift mask includes layout portions respectively corresponding to pixels and lens, in which each of the layout portions has: a light-blocking portion which has a shape of a substantially circle or a substantially concentric zone; a light-transmitting portion which has a shape of a substantially circle or a substantially concentric zone; a phase shift portion which has a shape of a substantially circle or a substantially concentric zone; and a light-blocking frame. Furthermore, the light-transmitting portion, the light-blocking portion and the phase shift portion are arranged alternately so as to form concentric circles, and the light-blocking frame corresponds to a whole or a part of a perimeter of the lens.