The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2010
Filed:
Feb. 03, 2004
Applicants:
Marcel Eduard Broekaart, Theys, FR;
Arnoud Willem Fortuin, Crolles, FR;
Inventors:
Marcel Eduard Broekaart, Theys, FR;
Arnoud Willem Fortuin, Crolles, FR;
Assignee:
NXP B.V., Eindhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/52 (2006.01); H01L 23/528 (2006.01); H01L 23/532 (2006.01); H01L 21/3213 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
Abstract
A metal interconnects structure, comprises a substrate (), a dielectric layer () lying above the substrate, a stop layer () for metal etching lying above the dielectric layer, a metal layer (') lying above the stop layer, said metal layer being patterned according to a desired pattern.
Quick Actions:
Broekaart, Marcel. (2010). Metal etching method for an interconnect structure and metal interconnect structure obtained by such method (U.S. Patent No. 7768129). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7768129
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile